Title: Patent approval by the Japan Patent Office (JPO)

Legal basis: Article 17 section 1 MAR - confidential information

Content of the Report:

The Management Board of XTPL ("Issuer", "Company", "XTPL") herebyreports that on 17 May 2024 it received the issue notification sent bythe Japan Patent Office which guarantees that the patent will be grantedfor an invention "Methods of dispensing a metallic nanoparticlecomposition form a nozzle onto a substrate".

The application procedure for this patent was initiated on 28 July 2020.This is also the date when patent protection started for the invention.The final formal requirement for obtaining the patent is to pay thenecessary fee. Should the requirement not be met, the Company willcommunicate this in a separate current report.

The patent protection will increase the value of the potentialcommercialization of the Company's technology with respect to theIssuer's technological solutions for the next generation electronicsmarket. The reported event confirms continued delivery of the Company'sstrategy of building a patent cloud for its proprietary technology andproducts, which will contribute to building the Issuer's credibilityamong potential industrial clients.

In view of the above, and considering the confirmation of uniqueness ofthe Company's technological solutions, and then the outlook for theIssuer's perception by investors, the Issuer's Management Board hasdecided that the notice of allowance and information related to allowedclaims should be deemed confidential information. For this reason, inthe opinion of the Management Board, the information meets the criteriaset out in Article 7(1) of the MAR.